Researchers from Nagoya University, Boise State University, Korea Institute of Fusion Energy, Hitachi High-Tech Corp. and Princeton Plasma Physics Laboratory published a technical paper titled “Recent Progress in Atomic-Scale Controlled Plasma Processing.” Abstract Excerpt: “Atomic-scale control in plasma processing is becoming increasingly critical for fabricating of advanced semiconductor devices, particularly as the industry shifts toward... » read more The post Advancements In Atomic-Scale Plasma Processing appeared first on Semiconductor Engineering .
Source: Semiconductor Engineering — read the full report at the original publisher.