Researchers from Utsunomiya University, RIKEN, The University of Tokyo, and Tohoku University, et al. have published “40% boost in extreme ultraviolet conversion efficiency via simultaneous dual-beam 2-µm laser irradiation”. Abstract “Scaling extreme ultraviolet (EUV) source power for next-generation lithography demands higher conversion efficiency (CE) at reduced per-pulse energies. We demonstrated a 40% CE enhancement by... » read more The post Boosting EUV Conversion Efficiency With 2-Micron Dual-Beam Laser Irradiation appeared first on Semiconductor Engineering .
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