Researchers from Hanyang University, Korea University, and Korea Institute of Industrial Technology have published “Failure-Aware Refinement of Vision-Language Model for Lithography Defect Detection”. Abstract “Semiconductor lithography inspection requires reliable detection of small pattern defects such as bridge, burr, pinch, and contamination. In this study, we propose a two-stage vision-language framework that combines initial defect detection... » read more The post Refining Vision-Language Models For Lithography Defect Detection appeared first on Semiconductor Engineering .
Source: Semiconductor Engineering — read the full report at the original publisher.