Researchers from Arizona State University and Intel Foundry have published “Graph Attention-Based Virtual Metrology for Film Deposition Processes in Semiconductor Manufacturing”. Abstract “Artificial intelligence-driven semiconductor manufacturing increasingly operates at nanometer and angstrom scales, where precise process control depends on accurate and timely metrology. However, physical metrology is limited by measurement latency, cost, and sampling constraints,... » read more The post Using Graph Attention for Virtual Metrology in Semiconductor Manufacturing (Intel Foundry, ASU) appeared
Source: Semiconductor Engineering — read the full report at the original publisher.