arXiv:2606.26713v1 Announce Type: new Abstract: As semiconductor technology nodes scale, computational lithography is essential for ensuring yield and performance. However, lithography is a continuous physical process involving mask optimization, optical imaging, resist exposure, and development, which existing models fail to capture. To overcome this limitation, we present LithoDreamer, the first physics-informed World Model (WM) framework for computational lithography, which formulates the ``Layout-Mask-Resist Image-After Development Image (ADI)'' pipeline as a decision-driven multi-step evo
As semiconductor technology nodes scale to extreme levels, existing lithography models are no longer sufficient, driving the need for more sophisticated, physics-informed approaches like World Models.
Improving computational lithography is critical for maintaining the pace of Moore's Law and ensuring the yield and performance of next-generation semiconductors, directly impacting the global technology landscape.
This advancement provides a more holistic and accurate modeling framework for the complex multi-stage lithography process, enabling better optimization and potentially faster development cycles for advanced chips.
- · Semiconductor Foundries
- · Lithography Equipment Manufacturers
- · AI/ML for Engineering Software Vendors
- · High-Performance Computing
- · Legacy Lithography Software Providers
Refined lithography processes lead to increased chip density and performance, enabling more powerful AI and computing systems.
Enhanced chip manufacturing capabilities could shift competitive advantages within the global semiconductor industry, particularly for nations investing heavily in domestic chip production.
Accelerated semiconductor advancement could further drive the development of new AI paradigms and applications, pushing the boundaries of what is computationally feasible.
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Read at arXiv cs.AI